- Intel reintroduces high-volume manufacturing of semiconductors using Extreme Ultraviolet (EUV) lithography, with potential implications for the semiconductor value chain across Europe.
- The new adaptation of EUV technology might assert influence over future Intel processors, shaping the landscape of semiconductor manufacturing.
Semiconductor manufacturing is witnessing a giant leap forward as Intel resumes high-volume manufacturing using Extreme Ultraviolet (EUV) lithography in its Ireland plant. This latest development is poised to revolutionize the semiconductor industry, not just within Intel's operations but also for the broader value chain across Europe.
EUV lithography emerges as an increasingly important technology in semiconductor innovation. The ability of EUV lithography to pattern smaller features on the semiconductor wafers allows the development of more powerful and energy-efficient microchips. The resumption of high-volume manufacturing means that Intel can unlock new thresholds of performance and power efficiency in their future processors.
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